Improvements in graphite-based x-ray mask fabrication for ultradeep x-raylithography.
No abstract prepared.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne,IL
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-06CH11357
- OSTI ID:
- 898177
- Report Number(s):
- ANL/XFD/CP-110280
- Journal Information:
- Microsyst. Technol., Journal Name: Microsyst. Technol. Journal Issue: 10 Vol. 10
- Country of Publication:
- United States
- Language:
- ENGLISH
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