Graphite-based x-ray masks for deep and ultradeep x-ray lithography.
Journal Article
·
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
No abstract prepared.
- Research Organization:
- Advanced Photon Source, Argonne National Lab., IL (US); Louisiana Tech Univ.; Louisiana State Univ.; Forschungszentrum Karlsruhe (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 15002998
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 16
- Country of Publication:
- United States
- Language:
- English
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