Ultrathin ta-C films on heads depositied by twist-filteredcathodic arc carbon plasmas
It is known that filtered cathodic-arc-deposited ta-C films have outstanding properties even within the family of diamondlike materials. However, filtering of macroparticles is usually incomplete or accompanied by significant plasma losses. Ongoing research effort is directed towards the following goals: (1) complete elimination of macro- and nanoparticles from the vacuum arc plasma, (2) increase of plasma utilization in the cathodic-arc and macroparticle-filter system, (3) precise control and reproducibility of film deposition, and (4) synthesis of ultrathin films (< 5 nm) that meet requirements of the magnetic storage industry. The development of new filters, in particular the ''Twist Filter'', enables cathodic arc plasma deposition to synthesize ultrathin ta-C films of 3 nm on heads that pass corrosion and other relevant tests. We describe the Twist Filter system and report about recent ta-C tests results. In light of these results, even thinner films seem to be possible.
- Research Organization:
- Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
- Sponsoring Organization:
- USDOE. LTRD program of DOE
- DOE Contract Number:
- AC02-05CH11231
- OSTI ID:
- 877606
- Report Number(s):
- LBNL--45979; BnR: 600301010
- Country of Publication:
- United States
- Language:
- English
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