Energetic deposition using filtered cathodic arc plasmas

Journal Article · Sun Jul 15 04:00:00 EDT 2001 · Vacuum

OSTI ID:805111

Anders, Andre ^[1]

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1. LBNL Library

Energetic deposition can be defined as a film deposition process in which a significant fraction of particles arrives at the substrate surface with a kinetic energy greater than the bulk displacement energy of the substrate. Examples of energetic deposition processes are ion beam assisted deposition (IBAD), plasma immersion ion deposition, pulsed laser deposition, and cathodic arc deposition. This work focuses on the production, properties, and use of filtered cathodic arc plasmas. Even without bias, dense metal and metal compound films can be obtained. Biasing the substrate, e.g. using the pulsed biasing technique of plasma immersion ion deposition, extents the possibilities of tuning film properties such as adhesion, stress, surface roughness, elastic modulus, hardness, and density. The formation of ultrathin ta-C (diamondlike carbon) films and metal films will be discussed.

• Research Organization: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
• Sponsoring Organization: USDOE Director, Office of Science (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 805111
• Report Number(s): LBNL--47779
• Journal Information: Vacuum, Journal Name: Vacuum Journal Issue: 3-4 Vol. 67; ISSN VACUAV; ISSN 0042-207X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ADHESION
CARBON
DEPOSITION
ENERGETIC DEPOSITION METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION (MEPIIID) FILM STRESS ADHESION FILTERED CATHODIC ARC SUBPLANTATION ATOMIC SCALE HEATING
HARDNESS
ION BEAMS
KINETIC ENERGY
LASERS
PLASMA
PRODUCTION
ROUGHNESS
SUBSTRATES
TUNING