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Process for the fabrication of aluminum metallized pyrolytic graphite sputtering targets

Patent ·
OSTI ID:87728
An improved method is disclosed for fabricating pyrolytic graphite sputtering targets with superior heat transfer ability, longer life, and maximum energy transmission. Anisotropic pyrolytic graphite is contoured and/or segmented to match the erosion profile of the sputter target and then oriented such that the graphite`s high thermal conductivity planes are in maximum contact with a thermally conductive metal backing. The graphite contact surface is metallized, using high rate physical vapor deposition (HRPVD), with an aluminum coating and the thermally conductive metal backing is joined to the metallized graphite target by one of four low-temperature bonding methods; liquid-metal casting, powder metallurgy compaction, eutectic brazing, and laser welding. 11 figs.
Research Organization:
University of California
DOE Contract Number:
W-7405-ENG-48
Assignee:
Univ. of California, Oakland, CA (United States)
Patent Number(s):
US 5,428,882/A/
Application Number:
PAN: 8-042,704
OSTI ID:
87728
Country of Publication:
United States
Language:
English

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