Apparatus and process for deposition of hard carbon films

Patent · Sun Jan 01 00:00:00 EST 1989

OSTI ID:875224

Nyaiesh, Ali R. ^[1]; Garwin, Edward L. ^[2]

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1. Menlo Park, CA
2. Los Altos, CA

A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

• Research Organization: Stanford Linear Accelerator Center (SLAC), Menlo Park, CA (United States); SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC03-76SF00515
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): H000566
• Application Number: 06/804680
• OSTI ID: 875224
• Resource Relation: Patent File Date: 1985 Dec 04
• Country of Publication: United States
• Language: English

Related Subjects

statutory invention registration
apparatus
process
deposition
hard
carbon
films
depositing
amorphous
extreme
hardness
substrate
described
enclosed
chamber
maintained
atmospheric
pressure
houses
plasma
producing
elements
electrode
comprised
cavity
rf
coil
excites
located
excited
radio
frequency
power
applied
magnetic
field
confines
produced
walls
focuses
yielding
film
deposits
purity
rapid
buildup
methods
prior
rf coil
plasma produced
closed chamber
amorphous carbon
hard carbon
radio frequency
magnetic field
atmospheric pressure
carbon film
plasma producing
carbon films
frequency power
chamber maintained
power applied
enclosed chamber
producing elements
/427/118/