New radio frequency technique for deposition of hard carbon films
We have developed a new technique to produce diamondlike carbon films in an RF system with water-cooled electrodes. Hydrocarbon gas is leaked into the experimental chamber through the upper electrode which is a Pyrex cylinder inside a coil forming an RF oven. The gas (CH/sub 4/) undergoes ionization/dissociation in one RF field, within an axial magnetic field. A circular water-cooled electrode supports the substrate to be coated, and is powered from a second RF generator, developing a negative self-bias on the substrate. Thus dissociation and ion production at the upper electrode and ion acceleration by the lower electrode could be separately controlled to optimize the film properties. It is shown that low stress, highly dense carbon films can be deposited by this method. Information is also given on bulk and surface properties as well as modification of these properties by the deposition conditions.
- Research Organization:
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- OSTI ID:
- 5493145
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Vol. 3:3
- Country of Publication:
- United States
- Language:
- English
Similar Records
Diamondlike carbon deposition on silicon using radio-frequency inductive plasma of Ar and C{sub 2}H{sub 2} gas mixture in plasma immersion ion deposition
Processing of diamondlike carbon using plasma immersion ion deposition
Related Subjects
CARBON
DEPOSITION
ELECTRICAL PROPERTIES
OPTICAL PROPERTIES
SURFACE COATING
SURFACE PROPERTIES
AUGER ELECTRON SPECTROSCOPY
CORROSION RESISTANCE
DISSOCIATION
ELECTRODES
ETCHING
IONIZATION
MASS SPECTROSCOPY
METHANE
PHOTOELECTRON SPECTROSCOPY
PHYSICAL PROPERTIES
ALKANES
ELECTRON SPECTROSCOPY
ELEMENTS
HYDROCARBONS
NONMETALS
ORGANIC COMPOUNDS
SPECTROSCOPY
SURFACE FINISHING
360601* - Other Materials- Preparation & Manufacture
360603 - Materials- Properties