Flat panel display using Ti-Cr-Al-O thin film

Patent · Tue Jan 01 04:00:00 EST 2002

OSTI ID:874591

Jankowski, Alan F ^[1]; Schmid, Anthony P ^[2]

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1. Livermore, CA
2. Solan Beach, CA

Thin films of Ti--Cr--Al--O are used as a resistor material. The films are rf sputter deposited from ceramic targets using a reactive working gas mixture of Ar and O.sub.2. Resistivity values from 10.sup.4 to 10.sup.10 Ohm-cm have been measured for Ti--Cr--Al--O film <1 .mu.m thick. The film resistivity can be discretely selected through control of the target composition and the deposition parameters. The application of Ti--Cr--Al--O as a thin film resistor has been found to be thermodynamically stable, unlike other metal-oxide films. The Ti--Cr--Al--O film can be used as a vertical or lateral resistor, for example, as a layer beneath a field emission cathode in a flat panel display; or used to control surface emissivity, for example, as a coating on an insulating material such as vertical wall supports in flat panel displays.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• DOE Contract Number: W-7405-ENG-48
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): US 6420826
• OSTI ID: 874591
• Country of Publication: United States
• Language: English

Related Subjects

/313/338/
10sup10
10sup4
&lt;1
application
beneath
cathode
ceramic
coating
composition
control
deposited
deposition
discretely
display
displays
emission
emissivity
example
field
field emission
film
films
flat
found
gas
gas mixture
insulating
lateral
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mixture
mum
ohm-cm
osub2
panel
panel display
parameters
reactive
resistivity
resistivity values
resistor
resistor material
rf
rf sputter
selected
sputter
sputter deposit
stable
supports
surface
target
targets
thermodynamically
thick
ti--cr--al--o
ti-cr-al-o
unlike
values
vertical
wall