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Phase-shifting point diffraction interferometer grating designs

Patent ·
OSTI ID:873581
 [1];  [2];  [3]
  1. Oakland, CA
  2. Berkeley, CA
  3. San Carlos, CA
+ Show Author Affiliations
In a phase-shifting point diffraction interferometer, by sending the zeroth-order diffraction to the reference pinhole of the mask and the first-order diffraction to the test beam window of the mask, the test and reference beam intensities can be balanced and the fringe contrast improved. Additionally, using a duty cycle of the diffraction grating other than 50%, the fringe contrast can also be improved.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
DOE Contract Number:
AC03-76SF00098
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6195169
OSTI ID:
873581
Country of Publication:
United States
Language:
English

References (4)

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309563
conference June 1998
Effect of intensity error correlation on the computed phase of phase-shifting interferometry journal January 1990
Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures journal November 1995
Phase-shifting point diffraction interferometer journal January 1996

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Related Subjects

/356/
50
additionally
balanced
beam
beam window
contrast
cycle
designs
diffraction
diffraction grating
diffraction interferometer
duty
duty cycle
first-order
first-order diffraction
fringe
fringe contrast
grating
grating designs
improved
intensities
interferometer
mask
phase-shifting
pinhole
reference
reference beam
reference pinhole
sending
window
zeroth-order
zeroth-order diffraction