Electrostatically screened, voltage-controlled electrostatic chuck

Patent · Sun Dec 31 23:00:00 EST 2000

OSTI ID:873479

Klebanoff, Leonard Elliott ^[1]

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1. San Ramon, CA

Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.

• Research Organization: SANDIA CORP
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV, L.L.C. (Livermore, CA)
• Patent Number(s): US 6169652
• OSTI ID: 873479
• Country of Publication: United States
• Language: English

Related Subjects

/361/
adapted
addition
attached
base
block
chuck
comprising
connected
contaminant
control
deposition
effectively
effectively prevents
electric
electric field
electric fields
electrode
electrodes
electrostatic
electrostatic chuck
electrostatic particle
electrostatically
electrostatically screened
eliminating
embedded
employing
fields
front
front surface
holding
insulator
insulator block
issuing
likelihood
lithographic
masks
operations
outer
outer perimeter
pair
particle
particle deposition
particularly
particularly suited
perimeter
permits
planar
planar surface
positioned
prevents
prevents electric
primary
provides
reduce
screened
shield
shielding
significantly
significantly reduce
source
stray
sub-atmospheric
substrate
substrates
suited
support
support base
surface
surface adapted
typically
upper
voltage
voltage-controlled
voltage-controlled electrostatic
wafers
wrapping