skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Electrostatically screened, voltage-controlled electrostatic chuck

Abstract

Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.

Inventors:
 [1]
  1. San Ramon, CA
Publication Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
873479
Patent Number(s):
US 6169652
Assignee:
EUV, L.L.C. (Livermore, CA)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
electrostatically; screened; voltage-controlled; electrostatic; chuck; employing; particularly; suited; holding; wafers; masks; sub-atmospheric; operations; significantly; reduce; likelihood; contaminant; deposition; substrates; insulator; block; outer; perimeter; planar; surface; adapted; support; substrate; comprising; electrode; typically; pair; electrodes; embedded; source; voltage; connected; base; attached; primary; shield; positioned; permits; control; lithographic; addition; provides; shielding; stray; electric; fields; issuing; effectively; prevents; wrapping; upper; front; eliminating; particle; significantly reduce; electrostatic chuck; particle deposition; particularly suited; electric field; planar surface; front surface; electric fields; outer perimeter; insulator block; surface adapted; prevents electric; support base; effectively prevents; voltage-controlled electrostatic; electrostatic particle; electrostatically screened; /361/

Citation Formats

Klebanoff, Leonard Elliott. Electrostatically screened, voltage-controlled electrostatic chuck. United States: N. p., 2001. Web.
Klebanoff, Leonard Elliott. Electrostatically screened, voltage-controlled electrostatic chuck. United States.
Klebanoff, Leonard Elliott. Mon . "Electrostatically screened, voltage-controlled electrostatic chuck". United States. https://www.osti.gov/servlets/purl/873479.
@article{osti_873479,
title = {Electrostatically screened, voltage-controlled electrostatic chuck},
author = {Klebanoff, Leonard Elliott},
abstractNote = {Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

Save / Share: