Electrostatically screened, voltage-controlled electrostatic chuck

Patent · Mon Jan 01 00:00:00 EST 2001

OSTI ID:873479

Klebanoff, Leonard Elliott ^[1]

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1. San Ramon, CA

Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV, L.L.C. (Livermore, CA)
• Patent Number(s): US 6169652
• OSTI ID: 873479
• Country of Publication: United States
• Language: English

Related Subjects

electrostatically
screened
voltage-controlled
electrostatic
chuck
employing
particularly
suited
holding
wafers
masks
sub-atmospheric
operations
significantly
reduce
likelihood
contaminant
deposition
substrates
insulator
block
outer
perimeter
planar
surface
adapted
support
substrate
comprising
electrode
typically
pair
electrodes
embedded
source
voltage
connected
base
attached
primary
shield
positioned
permits
control
lithographic
addition
provides
shielding
stray
electric
fields
issuing
effectively
prevents
wrapping
upper
front
eliminating
particle
significantly reduce
electrostatic chuck
particle deposition
particularly suited
electric field
planar surface
front surface
electric fields
outer perimeter
insulator block
surface adapted
prevents electric
support base
effectively prevents
voltage-controlled electrostatic
electrostatic particle
electrostatically screened
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