Projection optics box

Patent · Sat Jan 01 04:00:00 EST 2000

OSTI ID:873381

Hale, Layton C ^[1]; Malsbury, Terry ^[2]; Hudyma, Russell M ^[3]; Parker, John M ^[2]

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1. Livermore, CA
2. Tracy, CA
3. San Ramon, CA

A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 6147818
• OSTI ID: 873381
• Country of Publication: United States
• Language: English

Related Subjects

/359/
10-14
actuator
actuators
assembly
assembly comprised
box
bulkheads
comprised
constraint
construction
degrees
developed
due
euvl
exact
exact constraint
example
extreme
extreme ultraviolet
form
freedom
highly
highly reflective
housing
housing assembly
image
laser
lithography
mask
maximum
mirrors
mounted
nm
optical
optical assembly
optical image
optical signal
optics
optics box
photons
piston
plurality
positioned
positioned precisely
precisely
precision
projection
projection optics
providing
ray photons
receiving
reflective
reflective mirror
reflective mirrors
reflects
remotely
rigidity
secured
series
signal
silicon
silicon wafer
soft
soft x-ray
source
source assembly
target
tilt
tip
ultraviolet
ultraviolet lithography
unit
unit construction
utilizes
via
wafer
wall
x-ray
x-ray photon
x-ray photons