Projection optics box

Patent · Sat Jan 01 00:00:00 EST 2000

OSTI ID:873381

Hale, Layton C ^[1]; Malsbury, Terry ^[2]; Hudyma, Russell M ^[3]; Parker, John M ^[2]

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1. Livermore, CA
2. Tracy, CA
3. San Ramon, CA

A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 6147818
• OSTI ID: 873381
• Country of Publication: United States
• Language: English

Related Subjects

projection
optics
box
assembly
optical
extreme
ultraviolet
lithography
euvl
10-14
nm
soft
x-ray
photons
utilizes
plurality
highly
reflective
mirrors
mounted
precision
actuator
reflects
image
mask
target
silicon
wafer
example
receiving
signal
source
developed
laser
via
series
housing
comprised
bulkheads
wall
secured
form
unit
construction
maximum
rigidity
due
actuators
positioned
precisely
remotely
tip
tilt
piston
degrees
freedom
providing
exact
constraint
source assembly
reflective mirrors
housing assembly
highly reflective
ultraviolet lithography
extreme ultraviolet
soft x-ray
optical signal
silicon wafer
optical assembly
positioned precisely
optics box
optical image
projection optics
reflective mirror
unit construction
x-ray photons
exact constraint
ray photons
x-ray photon
assembly comprised
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