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Automated control of linear constricted plasma source array

Patent ·
OSTI ID:873345
An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
DOE Contract Number:
AC03-76SF00098
Assignee:
Regents of University of California (Oakland, CA); CRFilms Inc. (Martinsville, VA)
Patent Number(s):
US 6140773
OSTI ID:
873345
Country of Publication:
United States
Language:
English

References (6)

Some characteristics of the hollow‐anode ion source journal April 1992
The working principle of the hollow-anode plasma source journal November 1995
Spectroscopy of hollow anode discharge journal January 1984
Hollow anode ion–electron source journal June 1984
Hollow anode ion source journal January 1990
Hollow‐anode plasma source for molecular beam epitaxy of gallium nitride journal March 1996