Automated control of linear constricted plasma source array
Patent
·
OSTI ID:873345
- Albany, CA
- Martinsville, VA
An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- Regents of University of California (Oakland, CA); CRFilms Inc. (Martinsville, VA)
- Patent Number(s):
- US 6140773
- OSTI ID:
- 873345
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
/315/204/
absolute
adjusted
adjusting
apparatus
array
automated
automated control
below
chambers
combination
compared
constricted
constricted glow
contamination
control
controlling
current
current value
deposition
desired
desired value
desired values
detection
detection limit
detection limits
discharge
discharge chamber
discharged
disclosed
electrical
energy
feed
film
flow
gas
gas feed
gas mixture
gas mixtures
geometry
glow
glow discharge
improve
limits
linear
linear array
match
measured
measured value
method
minimized
mixtures
mounted
opposite
optical
parallel
particularly
plasma
plasma source
plasma sources
polarity
power
practical
pressure
provide
quality
relative
sensors
series
set
source
sources
sustained
tracks
ultra
values
absolute
adjusted
adjusting
apparatus
array
automated
automated control
below
chambers
combination
compared
constricted
constricted glow
contamination
control
controlling
current
current value
deposition
desired
desired value
desired values
detection
detection limit
detection limits
discharge
discharge chamber
discharged
disclosed
electrical
energy
feed
film
flow
gas
gas feed
gas mixture
gas mixtures
geometry
glow
glow discharge
improve
limits
linear
linear array
match
measured
measured value
method
minimized
mixtures
mounted
opposite
optical
parallel
particularly
plasma
plasma source
plasma sources
polarity
power
practical
pressure
provide
quality
relative
sensors
series
set
source
sources
sustained
tracks
ultra
values