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Constricted glow discharge plasma source

Patent ·
OSTI ID:873337
 [1];  [1];  [2];  [3];  [4]
  1. Albany, CA
  2. San Leandro, CA
  3. Berkeley, CA
  4. Winnetka, IL
+ Show Author Affiliations
A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
DOE Contract Number:
AC03-76SF00098
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6137231
OSTI ID:
873337
Country of Publication:
United States
Language:
English

References (6)

Some characteristics of the hollow‐anode ion source journal April 1992
The working principle of the hollow-anode plasma source journal November 1995
Spectroscopy of hollow anode discharge journal January 1984
Hollow anode ion–electron source journal June 1984
Hollow anode ion source journal January 1990
Hollow‐anode plasma source for molecular beam epitaxy of gallium nitride journal March 1996

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/315/118/313/
applying
argon
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below
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constricted
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contamination
deposition
detection
detection limit
detection limits
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energy
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gallium
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geometry
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low-energy
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method
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minimized
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nitride
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oxide
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oxygen
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polarity
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provide
providing
series
set
source
sources
substances
suitable
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sustained
tungsten
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water
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