3-D laser patterning process utilizing horizontal and vertical patterning
- Livermore, CA
- Berkeley, CA
A process which vastly improves the 3-D patterning capability of laser pantography (computer controlled laser direct-write patterning). The process uses commercially available electrodeposited photoresist (EDPR) to pattern 3-D surfaces. The EDPR covers the surface of a metal layer conformally, coating the vertical as well as horizontal surfaces. A laser pantograph then patterns the EDPR, which is subsequently developed in a standard, commercially available developer, leaving patterned trench areas in the EDPR. The metal layer thereunder is now exposed in the trench areas and masked in others, and thereafter can be etched to form the desired pattern (subtractive process), or can be plated with metal (additive process), followed by a resist stripping, and removal of the remaining field metal (additive process). This improved laser pantograph process is simpler, faster, move manufacturable, and requires no micro-machining.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 6114097
- OSTI ID:
- 873215
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
laser
patterning
process
utilizing
horizontal
vertical
vastly
improves
capability
pantography
computer
controlled
direct-write
commercially
available
electrodeposited
photoresist
edpr
pattern
surfaces
covers
surface
metal
layer
conformally
coating
pantograph
patterns
subsequently
developed
standard
developer
leaving
patterned
trench
thereunder
exposed
masked
thereafter
etched
form
desired
subtractive
plated
additive
followed
resist
stripping
removal
remaining
field
improved
simpler
faster
move
manufacturable
requires
micro-machining
additive process
computer controlled
metal layer
commercially available
process utilizing
computer control
desired pattern
laser patterning
improved laser
horizontal surface
laser pantography
field metal
vastly improves
controlled laser
laser pantograph
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