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Method for altering the luminescence of a semiconductor

Patent ·
OSTI ID:872098

A method is described for altering the luminescence of a light emitting semiconductor (LES) device. In particular, a method is described whereby a silicon LES device can be selectively irradiated with a radiation source effective for altering the intensity of luminescence of the irradiated region.

Research Organization:
AT & T CORP
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5858559
OSTI ID:
872098
Country of Publication:
United States
Language:
English

References (6)

Three-Dimensional Quantum Well Effects in Ultrafine Silicon Particles journal November 1988
Quantum size effects on photoluminescence in ultrafine Si particles journal June 1990
Porous silicon oxynitrides formed by ammonia heat treatment journal April 1990
Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers journal September 1990
Quantum size effects on the optical band gap of microcrystalline Si:H journal September 1988
Putting Some Spark in Silicon journal May 1991