Semiconductor tunnel junction with enhancement layer
Patent
·
OSTI ID:871198
- Sandia Park, NM
- Albuquerque, NM
The incorporation of a pseudomorphic GaAsSb layer in a runnel diode structure affords a new degree of freedom in designing runnel junctions for p-n junction device interconnects. Previously only doping levels could be varied to control the tunneling properties. This invention uses the valence band alignment band of the GaAsSb with respect to the surrounding materials to greatly relax the doping requirements for tunneling.
- Research Organization:
- SANDIA CORP
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- US 5679963
- OSTI ID:
- 871198
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
/257/
affords
alignment
band
control
degree
designing
device
diode
diode structure
doping
doping levels
enhancement
enhancement layer
freedom
gaassb
gaassb layer
greatly
incorporation
interconnects
junction
junction device
junctions
layer
levels
materials
p-n
p-n junction
previously
properties
pseudomorphic
relax
requirements
respect
runnel
sb layer
semiconductor
structure
structure affords
surrounding
tunnel
tunnel junction
tunneling
valence
valence band
varied
affords
alignment
band
control
degree
designing
device
diode
diode structure
doping
doping levels
enhancement
enhancement layer
freedom
gaassb
gaassb layer
greatly
incorporation
interconnects
junction
junction device
junctions
layer
levels
materials
p-n
p-n junction
previously
properties
pseudomorphic
relax
requirements
respect
runnel
sb layer
semiconductor
structure
structure affords
surrounding
tunnel
tunnel junction
tunneling
valence
valence band
varied