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Semiconductor tunnel junction with enhancement layer

Patent ·
OSTI ID:871198
The incorporation of a pseudomorphic GaAsSb layer in a runnel diode structure affords a new degree of freedom in designing runnel junctions for p-n junction device interconnects. Previously only doping levels could be varied to control the tunneling properties. This invention uses the valence band alignment band of the GaAsSb with respect to the surrounding materials to greatly relax the doping requirements for tunneling.
Research Organization:
SANDIA CORP
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5679963
OSTI ID:
871198
Country of Publication:
United States
Language:
English

References (7)

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In 1− x Ga x As‐GaSb 1− y As y heterojunctions by molecular beam epitaxy journal August 1977
Growth and properties of GaAsSb/InGaAs superlattices on InP journal May 1991
Monolithic, series-connected InP/Ga/sub 0.47/In/sub 0.53/As tandem solar cells conference January 1993
AlGaAs/GaInP heterojunction tunnel diode for cascade solar cell application journal August 1993