Semiconductor tunnel junction with enhancement layer
Patent
·
OSTI ID:871198
- Sandia Park, NM
- Albuquerque, NM
The incorporation of a pseudomorphic GaAsSb layer in a runnel diode structure affords a new degree of freedom in designing runnel junctions for p-n junction device interconnects. Previously only doping levels could be varied to control the tunneling properties. This invention uses the valence band alignment band of the GaAsSb with respect to the surrounding materials to greatly relax the doping requirements for tunneling.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- US 5679963
- OSTI ID:
- 871198
- Country of Publication:
- United States
- Language:
- English
Similar Records
Semiconductor tunnel junction with enhancement layer
GaAsSb-based heterojunction tunnel diodes for tandem solar cell interconnects
Enhanced doping efficiency of ultrawide band gap semiconductors by metal-semiconductor junction assisted epitaxy
Patent
·
Tue Oct 21 00:00:00 EDT 1997
·
OSTI ID:871198
GaAsSb-based heterojunction tunnel diodes for tandem solar cell interconnects
Conference
·
Sun Jan 01 00:00:00 EST 1995
·
OSTI ID:871198
+1 more
Enhanced doping efficiency of ultrawide band gap semiconductors by metal-semiconductor junction assisted epitaxy
Journal Article
·
Thu May 09 00:00:00 EDT 2019
· Physical Review Materials
·
OSTI ID:871198
+7 more
Related Subjects
semiconductor
tunnel
junction
enhancement
layer
incorporation
pseudomorphic
gaassb
runnel
diode
structure
affords
degree
freedom
designing
junctions
p-n
device
interconnects
previously
doping
levels
varied
control
tunneling
properties
valence
band
alignment
respect
surrounding
materials
greatly
relax
requirements
tunnel junction
p-n junction
valence band
structure affords
diode structure
gaassb layer
enhancement layer
sb layer
doping levels
junction device
/257/
tunnel
junction
enhancement
layer
incorporation
pseudomorphic
gaassb
runnel
diode
structure
affords
degree
freedom
designing
junctions
p-n
device
interconnects
previously
doping
levels
varied
control
tunneling
properties
valence
band
alignment
respect
surrounding
materials
greatly
relax
requirements
tunnel junction
p-n junction
valence band
structure affords
diode structure
gaassb layer
enhancement layer
sb layer
doping levels
junction device
/257/