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Highly doped layer for tunnel junctions in solar cells

Patent ·
OSTI ID:1373704
A highly doped layer for interconnecting tunnel junctions in multijunction solar cells is presented. The highly doped layer is a delta doped layer in one or both layers of a tunnel diode junction used to connect two or more p-on-n or n-on-p solar cells in a multijunction solar cell. A delta doped layer is made by interrupting the epitaxial growth of one of the layers of the tunnel diode, depositing a delta dopant at a concentration substantially greater than the concentration used in growing the layer of the tunnel diode, and then continuing to epitaxially grow the remaining tunnel diode.
Research Organization:
THE BOEING COMPANY, Chicago, IL (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FC36-07GO17052
Assignee:
THE BOEING COMPANY
Patent Number(s):
9,722,131
Application Number:
12/404,795
OSTI ID:
1373704
Country of Publication:
United States
Language:
English

References (5)

Ultrathin delta doped GaAs and AlAs tunnel junctions as interdevice ohmic contacts journal September 1993
AlGaAs/GaInP heterojunction tunnel diode for cascade solar cell application journal August 1993
Application of δ-doping in GaAs tunnel junctions journal January 1994
Growth and electrical characterization of Si delta‐doped GaInP by low pressure metalorganic chemical vapor deposition journal May 1996
Multi-junction III–V solar cells: current status and future potential journal July 2005

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