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Method and apparatus for micromachining using hard X-rays

Patent ·
OSTI ID:871193
 [1];  [2];  [3];  [3]
  1. Shoreham, NY
  2. Ridge, NY
  3. Madison, WI
+ Show Author Affiliations

An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures.

Research Organization:
ASSOC UNIVERSITIES INC
DOE Contract Number:
AC02-76CH00016
Assignee:
Wisconsin Alumni Research Foundation (Madison, WI)
Patent Number(s):
US 5679502
Application Number:
08/405,662
OSTI ID:
871193
Country of Publication:
United States
Language:
English

References (8)

PHOTON: A program for synchrotron radiation dose calculations
  • Chapman, Dean; Gmür, Nicholas; Lazarz, Nancy
  • Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 266, Issue 1-3 https://doi.org/10.1016/0168-9002(88)90381-6
journal April 1988
Fabrication of Microstructures of Extreme Structural Heights by Reaction Injection Molding journal September 1989
Experimental verification of PHOTON: A program for use in x-ray shielding calculations
  • Bräuer, Elke; Thomlinson, William
  • Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 266, Issue 1-3 https://doi.org/10.1016/0168-9002(88)90382-8
journal April 1988
Deep X-ray and UV lithographies for micromechanics conference January 1990
Fabrication of assembled micromechanical components via deep X-ray lithography conference January 1991
Precision machining using hard X-rays journal March 1994
Application of synchrotron radiation to x‐ray lithography journal December 1976
LIGA process: sensor construction techniques via X-ray lithography conference January 1988

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