Computer-aided engineering system for design of sequence arrays and lithographic masks

Patent · Wed Jan 01 00:00:00 EST 1997

OSTI ID:870782

Hubbell, Earl A ^[1]; Lipshutz, Robert J ^[2]; Morris, Macdonald S ^[3]; Winkler, James L ^[2]

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1. Mt. View, CA
2. Palo Alto, CA
3. San Jose, CA

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.

• Research Organization: Affymax Research Institute
• DOE Contract Number: FG03-92ER81275
• Assignee: Affymetrix, Inc. (Santa Clara, CA)
• Patent Number(s): US 5593839
• OSTI ID: 870782
• Country of Publication: United States
• Language: English

Related Subjects

computer-aided
engineering
design
sequence
arrays
lithographic
masks
improved
set
computer
tools
forming
according
aspect
select
probes
layout
array
dna
polymers
beneficial
characteristics
chip
files
generate
lithographic masks
sequence arrays
select probes
beneficial characteristics
computer tools
computer-aided engineering
chip design
generate lithographic
design files
improved set
forming arrays
lithographic mask
/435/430/999/