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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

Abstract

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).

Inventors:
 [1];  [2];  [3]
  1. (Mt. View, CA)
  2. (San Jose, CA)
  3. (Palo Alto, CA)
Publication Date:
Research Org.:
Affymax Research Institute
OSTI Identifier:
870673
Patent Number(s):
US 5571639
Assignee:
Affymax Technologies N.V. (Curaco, AN) OAK
DOE Contract Number:  
FG03-92ER81275
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; 100; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; 104; generate; 110; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /430/435/

Citation Formats

Hubbell, Earl A., Morris, MacDonald S., and Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1996. Web.
Hubbell, Earl A., Morris, MacDonald S., & Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, Earl A., Morris, MacDonald S., and Winkler, James L. Mon . "Computer-aided engineering system for design of sequence arrays and lithographic masks". United States. doi:. https://www.osti.gov/servlets/purl/870673.
@article{osti_870673,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, Earl A. and Morris, MacDonald S. and Winkler, James L.},
abstractNote = {An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}

Patent:

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