Computer-aided engineering system for design of sequence arrays and lithographic masks
Patent
·
OSTI ID:426639
An improved set of computer tools for forming arrays is disclosed. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks. 14 figs.
- Research Organization:
- Affymax Research Inst
- DOE Contract Number:
- FG03-92ER81275
- Assignee:
- Affymetrix, Inc., Santa Clara, CA (United States)
- Patent Number(s):
- US 5,593,839/A/
- Application Number:
- PAN: 8-460,411; CNN: Contract H600813-1;Contract H600813-2
- OSTI ID:
- 426639
- Resource Relation:
- Other Information: PBD: 14 Jan 1997
- Country of Publication:
- United States
- Language:
- English
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