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Title: Computer-aided engineering system for design of sequence arrays and lithographic masks

Abstract

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.

Inventors:
 [1];  [2];  [3];  [2]
  1. Mt. View, CA
  2. Palo Alto, CA
  3. San Jose, CA
Publication Date:
Research Org.:
Affymax Research Institute
OSTI Identifier:
870782
Patent Number(s):
US 5593839
Assignee:
Affymetrix, Inc. (Santa Clara, CA)
DOE Contract Number:  
FG03-92ER81275
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
computer-aided; engineering; design; sequence; arrays; lithographic; masks; improved; set; computer; tools; forming; according; aspect; select; probes; layout; array; dna; polymers; beneficial; characteristics; chip; files; generate; lithographic masks; sequence arrays; select probes; beneficial characteristics; computer tools; computer-aided engineering; chip design; generate lithographic; design files; improved set; forming arrays; lithographic mask; /435/430/999/

Citation Formats

Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, and Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States: N. p., 1997. Web.
Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, & Winkler, James L. Computer-aided engineering system for design of sequence arrays and lithographic masks. United States.
Hubbell, Earl A, Lipshutz, Robert J, Morris, Macdonald S, and Winkler, James L. Wed . "Computer-aided engineering system for design of sequence arrays and lithographic masks". United States. https://www.osti.gov/servlets/purl/870782.
@article{osti_870782,
title = {Computer-aided engineering system for design of sequence arrays and lithographic masks},
author = {Hubbell, Earl A and Lipshutz, Robert J and Morris, Macdonald S and Winkler, James L},
abstractNote = {An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {1}
}

Patent:

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