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Computer-aided engineering system for design of sequence arrays and lithographic masks

Patent ·
OSTI ID:870782
 [1];  [2];  [3];  [2]
  1. Mt. View, CA
  2. Palo Alto, CA
  3. San Jose, CA
+ Show Author Affiliations
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files to design and/or generate lithographic masks.
Research Organization:
Affymax Research Institute
DOE Contract Number:
FG03-92ER81275;
Assignee:
Affymetrix, Inc. (Santa Clara, CA)
Patent Number(s):
US 5593839
OSTI ID:
870782
Country of Publication:
United States
Language:
English

References (1)

Light-directed, spatially addressable parallel chemical synthesis journal February 1991

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/435/430/999/
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