Particle-free microchip processing

Patent · Mon Jan 01 04:00:00 EST 1996

OSTI ID:870442

Geller, Anthony S ^[1]; Rader, Daniel J ^[2]

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1. 7723 Storrie Pl. NE., Albuquerque, NM 87109
2. 7217 Ottawa Rd. NE., Albuquerque, NM 87109

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed.

• Research Organization: AT & T CORP
• DOE Contract Number: AC04-76DP00789
• Assignee: Geller, Anthony S. (7723 Storrie Pl. NE., Albuquerque, NM 87109);Rader, Daniel J. (7217 Ottawa Rd. NE., Albuquerque, NM 87109)
• Patent Number(s): US 5522933
• OSTI ID: 870442
• Country of Publication: United States
• Language: English

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particle
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particulate
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