Particle-free microchip processing

Patent · Tue Jun 04 04:00:00 EDT 1996

OSTI ID:242596

Geller, A S; Rader, D J

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed. 5 figs.

• Research Organization: AT&T Corporation
• DOE Contract Number: AC04-76DP00789
• Assignee: SNL; SN: 96001600398; PA: EDB-96:094809; 320303; SCA: 426000
• Patent Number(s): US 5,522,933/A/
• Application Number: PAN: 8-246,049
• OSTI ID: 242596
• Country of Publication: United States
• Language: English

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