Particle-free microchip processing

Patent · Mon Jan 01 00:00:00 EST 1996

OSTI ID:870442

Geller, Anthony S ^[1]; Rader, Daniel J ^[2]

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1. 7723 Storrie Pl. NE., Albuquerque, NM 87109
2. 7217 Ottawa Rd. NE., Albuquerque, NM 87109

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed.

• Research Organization: AT&T
• DOE Contract Number: AC04-76DP00789
• Assignee: Geller, Anthony S. (7723 Storrie Pl. NE., Albuquerque, NM 87109);Rader, Daniel J. (7217 Ottawa Rd. NE., Albuquerque, NM 87109)
• Patent Number(s): US 5522933
• OSTI ID: 870442
• Country of Publication: United States
• Language: English

Related Subjects

particle-free
microchip
processing
method
apparatus
reducing
particulate
contamination
disclosed
comprise
means
reduce
particle
velocity
wafer
particles
deposited
surface
reactor
electric
fields
prevent
porous
showerhead
velocities
processing method
reduce particle
electric field
electric fields
particulate contamination
wafer surface
apparatus comprise
particle velocity
microchip processing
reducing particulate
particle velocities
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