Fabrication of amorphous diamond films
Patent
·
OSTI ID:870201
- Livermore, CA
Amorphous diamond films having a significant reduction in intrinsic stress are prepared by biasing a substrate to be coated and depositing carbon ions thereon under controlled temperature conditions.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 5474816
- OSTI ID:
- 870201
- Country of Publication:
- United States
- Language:
- English
Internal stress reduction by nitrogen incorporation in hard amorphous carbon thin films
|
journal | June 1992 |
Structure and bonding studies of the C:N thin films produced by rf sputtering method
|
journal | November 1990 |
Compressive-stress-induced formation of thin-film tetrahedral amorphous carbon
|
journal | August 1991 |
Diamond and diamond-like phases
|
journal | August 1991 |
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Related Subjects
/427/423/
amorphous
amorphous diamond
biasing
carbon
coated
conditions
controlled
controlled temperature
depositing
depositing carbon
diamond
diamond film
diamond films
fabrication
films
intrinsic
intrinsic stress
prepared
reduction
significant
significant reduction
stress
substrate
temperature
temperature conditions
thereon
amorphous
amorphous diamond
biasing
carbon
coated
conditions
controlled
controlled temperature
depositing
depositing carbon
diamond
diamond film
diamond films
fabrication
films
intrinsic
intrinsic stress
prepared
reduction
significant
significant reduction
stress
substrate
temperature
temperature conditions
thereon