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Title: Fabrication of amorphous diamond films

Patent ·
OSTI ID:870201
 [1]
  1. Livermore, CA
+ Show Author Affiliations

Amorphous diamond films having a significant reduction in intrinsic stress are prepared by biasing a substrate to be coated and depositing carbon ions thereon under controlled temperature conditions.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 5474816
OSTI ID:
870201
Country of Publication:
United States
Language:
English

References (3)

Diamond and diamond-like phases journal August 1991
Internal stress reduction by nitrogen incorporation in hard amorphous carbon thin films journal June 1992
Structure and bonding studies of the C:N thin films produced by rf sputtering method journal November 1990

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Related Subjects

fabrication
amorphous
diamond
films
significant
reduction
intrinsic
stress
prepared
biasing
substrate
coated
depositing
carbon
thereon
controlled
temperature
conditions
amorphous diamond
temperature conditions
controlled temperature
significant reduction
diamond film
diamond films
depositing carbon
intrinsic stress
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