Optical processing furnace with quartz muffle and diffuser plate

Patent · Sat Dec 31 23:00:00 EST 1994

OSTI ID:870076

Sopori, Bhushan L ^[1]

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1. Denver, CO

An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.

• Research Organization: National Renewable Energy Laboratory (NREL), Golden, CO
• Assignee: Midwest Research Institute (Kansas City, MO)
• Patent Number(s): US 5452396
• OSTI ID: 870076
• Country of Publication: United States
• Language: English

Related Subjects

/438/118/216/219/250/359/392/427/
annealing
burn-in
comprising
controlling
diffuse
diffuser
diffuser plate
diffusive
door
energy
etched
feedback
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light
light impinging
light sensor
located
muffle
optical
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optical furnace
optical process
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plate
process
process wafer
processing
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provided
qualities
quartz
quartz diffuser
quartz muffle
sensor
source
surface
wafer
wafer comprising
wall