Optical processing furnace with quartz muffle and diffuser plate

Patent · Sun Jan 01 00:00:00 EST 1995

OSTI ID:870076

Sopori, Bhushan L ^[1]

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1. Denver, CO

An optical furnace for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process.

• Research Organization: National Renewable Energy Laboratory (NREL), Golden, CO (United States)
• DOE Contract Number: AC02-83CII10093
• Assignee: Midwest Research Institute (Kansas City, MO)
• Patent Number(s): US 5452396
• OSTI ID: 870076
• Country of Publication: United States
• Language: English

Related Subjects

optical
processing
furnace
quartz
muffle
diffuser
plate
annealing
process
wafer
comprising
source
energy
door
hold
diffuse
light
impinging
feedback
sensor
located
wall
provided
controlling
surface
etched
diffusive
qualities
intensity
burn-in
quartz muffle
diffuser plate
light sensor
optical energy
optical furnace
optical processing
quartz diffuser
light impinging
wafer comprising
optical process
processing furnace
process wafer
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