Process for depositing Cr-bearing layer

Patent · Tue May 09 00:00:00 EDT 1995

OSTI ID:869873

Ellis, Timothy W ^[1]; Lograsso, Thomas A ^[1]; Eshelman, Mark A ^[2]

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1. Ames, IA
2. Kentwood, MI

A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate.

• Research Organization: Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
• DOE Contract Number: W-7405-ENG-82
• Assignee: Iowa State University Research Foundation, Inc. (Ames, IA)
• Patent Number(s): US 5413821
• Application Number: 08/273,978
• OSTI ID: 869873
• Country of Publication: United States
• Language: English

Related Subjects

process
depositing
cr-bearing
layer
method
applying
substrate
comprises
introducing
organometallic
compound
vapor
solid
powder
form
entrained
carrier
gas
plasma
inductively
coupled
torch
device
thermally
decompose
contacting
coated
deposit
metallic
alloy
chromium
oxide
nitride
carbide
provided
typically
introduced
disposed
ambient
air
directed
coating
comprises introducing
inductively coupled
ambient air
carrier gas
plasma torch
coupled plasma
chromium oxide
powder form
organometallic compound
solid powder
thermally decompose
cr-bearing layer
metallic compound
/427/