The deposition of chromium by the use of an inductively-coupled radio-frequency plasma torch
- Ames Lab., IA (United States)
This paper discusses attempts to deposit a layer of hard Cr metal, with properties similar to those of layers currently obtained by electrolytic methods, onto a metallic substrate using an inductively-coupled, radio-frequency plasma torch (ICP-RF) torch. Preliminary studies indicated that it might be possible to produce a suitable layer using a number of chromium-based compounds. For this study, Cr powders and a chromium precursor were injected into the high temperature region of the plasma plume, where thermal decomposition of the feed material produced Cr atoms that deposited onto the surface of metal substrates placed below the plasma torch. The films produced were examined to determine thickness, chemical compositions, and adherence. Since the goal of the project was to develop a coating method that was not only industrially suitable but also environmentally safe, care was taken to monitor the emissions produced by the system during deposition.
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Environmental Protection Agency, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-82
- OSTI ID:
- 554056
- Journal Information:
- Scripta Materialia, Journal Name: Scripta Materialia Journal Issue: 10 Vol. 37; ISSN 1359-6462; ISSN SCMAF7
- Country of Publication:
- United States
- Language:
- English
Similar Records
Process for depositing Cr-bearing layer
Comparative study of laminar and turbulent flow model with different operating parameters for radio frequency-inductively coupled plasma torch working at 3 MHz frequency at atmospheric pressure