Process for depositing Cr-bearing layer
A method of applying a Cr-bearing layer to a substrate, comprises introducing an organometallic compound, in vapor or solid powder form entrained in a carrier gas to a plasma of an inductively coupled plasma torch or device to thermally decompose the organometallic compound and contacting the plasma and the substrate to be coated so as to deposit the Cr-bearing layer on the substrate. A metallic Cr, Cr alloy or Cr compound such as chromium oxide, nitride and carbide can be provided on the substrate. Typically, the organometallic compound is introduced to an inductively coupled plasma torch that is disposed in ambient air so to thermally decompose the organometallic compound in the plasma. The plasma is directed at the substrate to deposit the Cr-bearing layer or coating on the substrate. 7 figs.
- Research Organization:
- Iowa State Univ., Ames, IA (United States)
- DOE Contract Number:
- W-7405-ENG-82
- Assignee:
- Iowa State Univ. Research Foundation, Inc., Ames, IA (United States)
- Patent Number(s):
- US 5,413,821/A/
- Application Number:
- PAN: 8-273,978
- OSTI ID:
- 46310
- Resource Relation:
- Other Information: PBD: 9 May 1995
- Country of Publication:
- United States
- Language:
- English
Similar Records
The deposition of chromium by the use of an inductively-coupled radio-frequency plasma torch
The effect of postdeposition heat-treatment on reactively sputtered CrN[sub x] and Cr(N, O) coatings