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Title: Coupled microwave ECR and radio-frequency plasma source for plasma processing

Abstract

In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm.sup.2 at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance.

Inventors:
 [1];  [2]
  1. Oak Ridge, TN
  2. Knoxville, TN
Publication Date:
Research Org.:
LOCKHEED MARTIN ENRGY SYST INC
OSTI Identifier:
869178
Patent Number(s):
US 5292370
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
coupled; microwave; ecr; radio-frequency; plasma; source; processing; dual; device; discharge; means; initiation; control; operates; electron; cyclotron; resonance; generates; uniform; 1000; cm; pressures; below; mtorr; initiates; radio; frequency; rf; maintained; parallel; plates; charged; particles; supplying; copious; amounts; desired; excited; species; manner; plate; portion; apparatus; magnetic; filter; static; field; structure; aids; formation; zones; regions; assists; operating; plasma region; microwave discharge; pressures below; rf plasma; excited species; uniform plasma; uniform manner; magnetic filter; electron cyclotron; plasma source; radio frequency; charged particles; magnetic field; charged particle; plasma process; plasma processing; cyclotron resonance; static magnetic; microwave plasma; plasma device; parallel plates; parallel plate; frequency plasma; plasma initiation; dual plasma; coupled microwave; /118/156/

Citation Formats

Tsai, Chin-Chi, and Haselton, Halsey H. Coupled microwave ECR and radio-frequency plasma source for plasma processing. United States: N. p., 1994. Web.
Tsai, Chin-Chi, & Haselton, Halsey H. Coupled microwave ECR and radio-frequency plasma source for plasma processing. United States.
Tsai, Chin-Chi, and Haselton, Halsey H. Sat . "Coupled microwave ECR and radio-frequency plasma source for plasma processing". United States. https://www.osti.gov/servlets/purl/869178.
@article{osti_869178,
title = {Coupled microwave ECR and radio-frequency plasma source for plasma processing},
author = {Tsai, Chin-Chi and Haselton, Halsey H},
abstractNote = {In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm.sup.2 at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1994},
month = {1}
}

Patent:

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