Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Coupled microwave ECR and radio-frequency plasma source for plasma processing

Patent ·
OSTI ID:869178
 [1];  [2]
  1. Oak Ridge, TN
  2. Knoxville, TN
+ Show Author Affiliations
In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm.sup.2 at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance.
Research Organization:
LOCKHEED MARTIN ENRGY SYST INC
DOE Contract Number:
AC05-84OR21400
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)
Patent Number(s):
US 5292370
OSTI ID:
869178
Country of Publication:
United States
Language:
English

References (1)

Plasma-Assisted Etching Techniques for Pattern Delineation book January 1978

Similar Records

Coupled microwave ECR and radio-frequency plasma source for plasma processing
Patent · Mon Mar 07 23:00:00 EST 1994 · OSTI ID:5017678
Potential applications of a new microwave ECR (electron cyclotron resonance) multicusp plasma ion source
Conference · Sun Dec 31 23:00:00 EST 1989 · OSTI ID:6598238
Characteristics and potential applications of an ORNL microwave ECR multicusp plasma ion source
Conference · Sun Dec 31 23:00:00 EST 1989 · OSTI ID:6356930

Related Subjects

/118/156/
1000
aids
amounts
apparatus
assists
below
charged
charged particle
charged particles
cm
control
copious
coupled
coupled microwave
cyclotron
cyclotron resonance
desired
device
discharge
dual
dual plasma
ecr
electron
electron cyclotron
excited
excited species
field
filter
formation
frequency
frequency plasma
generates
initiates
initiation
magnetic
magnetic field
magnetic filter
maintained
manner
means
microwave
microwave discharge
microwave plasma
mtorr
operates
operating
parallel
parallel plate
parallel plates
particles
plasma
plasma device
plasma initiation
plasma process
plasma processing
plasma region
plasma source
plate
plates
portion
pressures
pressures below
processing
radio
radio frequency
radio-frequency
regions
resonance
rf
rf plasma
source
species
static
static magnetic
structure
supplying
uniform
uniform manner
uniform plasma
zones