Coupled microwave ECR and radio-frequency plasma source for plasma processing

Patent · Tue Mar 08 04:00:00 EST 1994

OSTI ID:5017678

Tsai, C C; Haselton, H H

In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm[sup 2] at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance. 4 figures.

• DOE Contract Number: AC05-84OR21400
• Assignee: Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States)
• Patent Number(s): A; US 5292370
• Application Number: PPN: US 7-930590
• OSTI ID: 5017678
• Country of Publication: United States
• Language: English

Related Subjects

661300* -- Other Aspects of Physical Science-- (1992-)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CYCLOTRON RESONANCE
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ELECTRON CYCLOTRON-RESONANCE
ELECTRONIC EQUIPMENT
EQUIPMENT
MICROWAVE EQUIPMENT
MICROWAVE RADIATION
PLASMA PRODUCTION
RADIATIONS
RESONANCE
USES