Potential applications of a new microwave ECR (electron cyclotron resonance) multicusp plasma ion source

Conference · Sun Dec 31 23:00:00 EST 1989

OSTI ID:6598238

Tsai, C C

A new microwave electron cyclotron resonance (ECR) multicusp plasma ion source using two ECR plasma production regions and multicusp plasma confinement has been developed at Oak Ridge National Laboratory. This source has been operated to produce uniform and dense plasmas over large areas of 300 to 400 cm{sup 2}. The plasma source has been operated with continuous argon gas feed and pulsed microwave power. The discharge initiation phenomena and plasma properties have been investigated and studied as functions of discharge parameters. Together with the discharge characteristics observed, a hypothetical discharge mechanism for this plasma source is reported and discussed. Potential applications, including plasma and ion-beam processing for manufacturing advanced microelectronics and for space electric propulsion, are discussed. 7 refs., 6 figs.

• Research Organization: Oak Ridge National Lab., TN (USA)
• Sponsoring Organization: DOE/ER
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6598238
• Report Number(s): CONF-901116-9; ON: DE91000707
• Country of Publication: United States
• Language: English

Related Subjects

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BEAM INJECTION HEATING
CAVITY RESONATORS
CUSPED GEOMETRIES
CYCLOTRON RESONANCE
ELECTRIC DISCHARGES
ELECTRON CYCLOTRON-RESONANCE
ELECTRONIC CIRCUITS
ELECTRONIC EQUIPMENT
EQUIPMENT
HEATING
HIGH-FREQUENCY DISCHARGES
ION PROPULSION
ION SOURCES
MAGNETIC FIELD CONFIGURATIONS
MAGNETIC FIELDS
MICROELECTRONIC CIRCUITS
OPEN CONFIGURATIONS
PLASMA DENSITY
PLASMA HEATING
PROPULSION
RESONANCE
RESONATORS
THERMONUCLEAR REACTORS
USES