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Hollow electrode plasma excitation source

Patent ·
OSTI ID:868244
A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.
Research Organization:
Pacific Northwest National Laboratory (PNNL), Richland, WA
DOE Contract Number:
AC06-76RL01830;
Assignee:
Battelle Memorial Institute (Richland, WA)
Patent Number(s):
US 5105123
OSTI ID:
868244
Country of Publication:
United States
Language:
English

References (4)

Silberbestimmung in Golddraht durch nichtthermische Anregung im Graphitrohrofen (FANES) journal January 1981
FANES (furnace atomic nonthermal excitation spectrometry)—a new emission technique with high detection power journal January 1981
Direct Solids Elemental Analysis: Pulsed Plasma Sources journal October 1987
Furnace atomisation with non-thermal excitation—Experimental evaluation of detection based on a high-resolution échelle monochromator incorporating automatic background correction journal January 1983