Hollow electrode plasma excitation source
Patent
·
OSTI ID:868244
- West Richland, WA
A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA
- DOE Contract Number:
- AC06-76RL01830
- Assignee:
- Battelle Memorial Institute (Richland, WA)
- Patent Number(s):
- US 5105123
- OSTI ID:
- 868244
- Country of Publication:
- United States
- Language:
- English
Direct Solids Elemental Analysis: Pulsed Plasma Sources
|
journal | October 1987 |
FANES (furnace atomic nonthermal excitation spectrometry)—a new emission technique with high detection power
|
journal | January 1981 |
Furnace atomisation with non-thermal excitation—Experimental evaluation of detection based on a high-resolution échelle monochromator incorporating automatic background correction
|
journal | January 1983 |
Silberbestimmung in Golddraht durch nichtthermische Anregung im Graphitrohrofen (FANES)
|
journal | January 1981 |
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Related Subjects
/315/250/313/
anode
cathode
characterizes
coaxial
discharge
disposed
electrode
electrode plasma
elevated
elevated temperature
elevated temperatures
emission
excitation
excitation source
furnace
gas
glow
glow discharge
heated
hollow
hollow anode
hollow electrode
housing
housing provided
incorporates
ionic
ionizable
ionizable gas
located
placed
plasma
plasma source
produced
provided
radiation
sample
source
temperatures
therewithin
anode
cathode
characterizes
coaxial
discharge
disposed
electrode
electrode plasma
elevated
elevated temperature
elevated temperatures
emission
excitation
excitation source
furnace
gas
glow
glow discharge
heated
hollow
hollow anode
hollow electrode
housing
housing provided
incorporates
ionic
ionizable
ionizable gas
located
placed
plasma
plasma source
produced
provided
radiation
sample
source
temperatures
therewithin