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Hollow electrode plasma excitation source

Patent ·
OSTI ID:7281176
A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures. 5 figs.
DOE Contract Number:
AC06-76RL01830
Assignee:
Battelle Memorial Inst., Richland, WA (United States)
Patent Number(s):
US 5105123; A
Application Number:
PPN: US 7-596417
OSTI ID:
7281176
Country of Publication:
United States
Language:
English