Negative ion source with hollow cathode discharge plasma

Patent · Fri Dec 31 23:00:00 EST 1982

OSTI ID:864524

Hershcovitch, Ady ^[1]; Prelec, Krsto ^[2]

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1. Mt. Sinai, NY
2. Setauket, NY

A negative ion source of the type where negative ions are formed by bombarding a low-work-function surface with positive ions and neutral particles from a plasma, wherein a highly ionized plasma is injected into an anode space containing the low-work-function surface. The plasma is formed by hollow cathode discharge and injected into the anode space along the magnetic field lines. Preferably, the negative ion source is of the magnetron type.

• Research Organization: Brookhaven National Laboratory (BNL), Upton, NY
• DOE Contract Number: AC02-76CH00016
• Assignee: United States of America as represented by Department of Energy (Washington, DC)
• Patent Number(s): US 4377773
• OSTI ID: 864524
• Country of Publication: United States
• Language: English

Related Subjects

/315/250/313/376/
anode
anode space
bombarding
cathode
cathode discharge
containing
discharge
discharge plasma
field
field lines
formed
highly
highly ionized
hollow
hollow cathode
injected
ionized
ionized plasma
lines
low-work-function
magnetic
magnetic field
magnetron
negative
neutral
neutral particle
neutral particles
node space
particles
plasma
positive
preferably
source
space
surface
type