skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method of making a piezoelectric shear wave resonator

Abstract

An acoustic shear wave resonator comprising a piezoelectric film having its C-axis substantially inclined from the film normal such that the shear wave coupling coefficient significantly exceeds the longitudinal wave coupling coefficient, whereby the film is capable of shear wave resonance, and means for exciting said film to resonate. The film is prepared by deposition in a dc planar magnetron sputtering system to which a supplemental electric field is applied. The resonator structure may also include a semiconductor material having a positive temperature coefficient of resonance such that the resonator has a temperature coefficient of resonance approaching 0 ppm/.degree.C.

Inventors:
 [1];  [2];  [2]
  1. (Harbor City, CA)
  2. (Ames, IA)
Publication Date:
Research Org.:
Ames Laboratory (AMES), Ames, IA; Iowa State University, Ames, IA (US)
OSTI Identifier:
866124
Patent Number(s):
US 4640756
Application Number:
06/736,164
Assignee:
United States of America as represented by United States (Washington, DC) AMES
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; piezoelectric; shear; wave; resonator; acoustic; comprising; film; c-axis; substantially; inclined; normal; coupling; coefficient; significantly; exceeds; longitudinal; whereby; capable; resonance; means; exciting; resonate; prepared; deposition; dc; planar; magnetron; sputtering; supplemental; electric; field; applied; structure; semiconductor; material; positive; temperature; approaching; ppm; degree; piezoelectric film; wave resonator; magnetron sputter; magnetron sputtering; temperature coefficient; shear wave; electric field; semiconductor material; significantly exceeds; c-axis substantially; resonator structure; coupling coefficient; wave coupling; planar magnetron; resonator comprising; substantially inclined; coefficient significantly; longitudinal wave; film normal; piezoelectric shear; acoustic shear; axis substantially; /204/

Citation Formats

Wang, Jin S., Lakin, Kenneth M., and Landin, Allen R. Method of making a piezoelectric shear wave resonator. United States: N. p., 1987. Web.
Wang, Jin S., Lakin, Kenneth M., & Landin, Allen R. Method of making a piezoelectric shear wave resonator. United States.
Wang, Jin S., Lakin, Kenneth M., and Landin, Allen R. Tue . "Method of making a piezoelectric shear wave resonator". United States. https://www.osti.gov/servlets/purl/866124.
@article{osti_866124,
title = {Method of making a piezoelectric shear wave resonator},
author = {Wang, Jin S. and Lakin, Kenneth M. and Landin, Allen R.},
abstractNote = {An acoustic shear wave resonator comprising a piezoelectric film having its C-axis substantially inclined from the film normal such that the shear wave coupling coefficient significantly exceeds the longitudinal wave coupling coefficient, whereby the film is capable of shear wave resonance, and means for exciting said film to resonate. The film is prepared by deposition in a dc planar magnetron sputtering system to which a supplemental electric field is applied. The resonator structure may also include a semiconductor material having a positive temperature coefficient of resonance such that the resonator has a temperature coefficient of resonance approaching 0 ppm/.degree.C.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {2}
}

Patent:

Save / Share: