Orientation filtering for crystalline films

Patent · Tue Dec 30 04:00:00 EST 1986

OSTI ID:866091

Smith, Henry I ^[1]; Atwater, Harry A ^[2]; Thompson, Carl V ^[3]; Geis, Michael W ^[4]

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1. Sudbury, MA
2. Somerville, MA
3. Watertown, MA
4. Acton, MA

A substrate is coated with a film to be recrystallized. A pattern of crystallization barriers is created in the film, for example, by etching voids in the film. An encapsulation layer is generally applied to protect the film, fill the voids and otherwise enhance a recrystallization process. Recrystallization is carried out such that certain orientations pass preferentially through the barrier, generally as a result of growth-velocity anisotropy. The result is a film of a specific predetermined crystallographic orientation, a range of orientations or a set of discrete orientations.

• Assignee: Massachusetts Institute of Technology (Cambridge, MA)
• Patent Number(s): US 4632723
• Application Number: 06/481,096
• OSTI ID: 866091
• Country of Publication: United States
• Language: English

Related Subjects

/117/
anisotropy
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barrier
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example
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