Chemical vapor deposition of sialon
Patent
·
OSTI ID:864253
- Livermore, CA
A laminated composite and a method for forming the composite by chemical vapor deposition. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200.degree. C.; and impinging a gas containing in a flowing atmosphere of air N.sub.2, SiCl.sub.4, and AlCl.sub.3 on the surface.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 4336304
- OSTI ID:
- 864253
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
/428/219/427/501/
1200
air
alcl
ammonia
atmosphere
bonded
chemical
chemical vapor
composite
containing
containing atmosphere
degree
deposition
exposing
flowing
forming
gas
gas containing
heating
impinging
laminated
laminated composite
layer
material
method
sialon
sicl
steps
surface
vapor
vapor deposition
1200
air
alcl
ammonia
atmosphere
bonded
chemical
chemical vapor
composite
containing
containing atmosphere
degree
deposition
exposing
flowing
forming
gas
gas containing
heating
impinging
laminated
laminated composite
layer
material
method
sialon
sicl
steps
surface
vapor
vapor deposition