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Chemical vapor deposition of sialon

Patent ·
OSTI ID:5417810
;
A laminated composite and a method for forming the composite by chemical vapor deposition are described. The composite includes a layer of sialon and a material to which the layer is bonded. The method includes the steps of exposing a surface of the material to an ammonia containing atmosphere; heating the surface to at least about 1200/sup 0/C; and impinging a gas containing N/sub 2/, SiCl/sub 4/, and AlCl/sub 3/ on the surface.
DOE Contract Number:
W-7405-ENG-48
Assignee:
TIC; ERA-05-024425; EDB-80-067018
Patent Number(s):
None
OSTI ID:
5417810
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ALUMINIUM CHLORIDES
ALUMINIUM COMPOUNDS
BONDING
CARBON
CERAMICS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CHLORIDES
CHLORINE COMPOUNDS
DEPOSITION
ELEMENTS
FABRICATION
GRAPHITE
HALIDES
HALOGEN COMPOUNDS
JOINING
LAYERS
METALS
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PNICTIDES
POROSITY
REFRACTORIES
REFRACTORY METALS
ROTORS
SILICON CHLORIDES
SILICON COMPOUNDS
SILICON NITRIDES
SORPTIVE PROPERTIES
SURFACE COATING
SURFACE PROPERTIES