Artificial dielectrics: Nonlinear properties of Si nanoclusters formed by ion implantation in SiO2glassy matrix
Journal Article
·
· Journal of Applied Physics
OSTI ID:859827
No abstract prepared.
- Research Organization:
- ORNL
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 859827
- Report Number(s):
- P01-111052
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 84; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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