Skip to main content

Relaxation of stresses in ta-C prepared by filtered cathodic arc deposition

Journal Article · Wed Sep 01 00:00:00 EDT 1999 · Journal of Applied Physics

OSTI ID:843036

Monteiro, Othon R ^[1]; Lee, Doug H; Lo, Roger Yu; Walter, Kevin C; Nastasi, Michael

LBNL Library

No abstract prepared.

Print

Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director. Office of Science. Office of Basic Energy Sciences. Contracts DE-AC03-76SF00098 and W-7405-ENG-36

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 843036

Report Number(s):: LBNL--45428

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 88; ISSN JAPIAU; ISSN 0021-8979

Country of Publication:: United States

Language:: English

Similar Records

Annealing of nonhydrogenated amorphous carbon films prepared by filtered cathodic arc deposition

Journal Article · Mon Jun 05 00:00:00 EDT 2000 · Journal of Applied Physics · OSTI ID:761418

Cathodic arc plasma deposition

Journal Article · Thu May 30 00:00:00 EDT 2002 · Vacuum Technology & Coating · OSTI ID:810482

Metallization of CVD diamond films by cathodic arc deposition

Journal Article · Tue Jul 01 00:00:00 EDT 1997 · Thin Solid Films · OSTI ID:773699

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
DEPOSITION
RELAXATION
STRESSES