High density arrays of micromirrors

Technical Report · Sun Jan 31 23:00:00 EST 1999

DOI:https://doi.org/10.2172/8222· OSTI ID:8222

Folta, J. M. ^[1]; Decker, J. Y. ^[2]; Kolman, J. ^[2]; Lee, C. ^[2]; Brase, J. M. ^[2]

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1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); LLNL
2. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

We established and achieved our goal to (1) fabricate and evaluate test structures based on the micromirror design optimized for maskless lithography applications, (2) perform system analysis and code development for the maskless lithography concept, and (3) identify specifications for micromirror arrays (MMAs) for LLNL's adaptive optics (AO) applications and conceptualize new devices.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE Office of Defense Programs (DP)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 8222
• Report Number(s): UCRL-ID--133164; YN0100000; 97-ERD-078; ON: DE00008222
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
Evaluation
Fabrication
Mirrors