Optimized micromirror arrays for adaptive optics
This paper describes the design, layout, fabrication, and surface characterization of highly optimized surface micromachined micromirror devices. Design considerations and fabrication capabilities are presented. These devices are fabricated in the state-of-the-art, four-level, planarized, ultra-low-stress polysilicon process available at Sandia National Laboratories known as the Sandia Ultra-planar Multi-level MEMS Technology (SUMMiT). This enabling process permits the development of micromirror devices with near-ideal characteristics that have previously been unrealizable in standard three-layer polysilicon processes. The reduced 1 {mu}m minimum feature sizes and 0.1 {mu}m mask resolution make it possible to produce dense wiring patterns and irregularly shaped flexures. Likewise, mirror surfaces can be uniquely distributed and segmented in advanced patterns and often irregular shapes in order to minimize wavefront error across the pupil. The ultra-low-stress polysilicon and planarized upper layer allow designers to make larger and more complex micromirrors of varying shape and surface area within an array while maintaining uniform performance of optical surfaces. Powerful layout functions of the AutoCAD editor simplify the design of advanced micromirror arrays and make it possible to optimize devices according to the capabilities of the fabrication process. Micromirrors fabricated in this process have demonstrated a surface variance across the array from only 2{endash}3 nm to a worst case of roughly 25 nm while boasting active surface areas of 98{percent} or better. Combining the process planarization with a {open_quotes}planarized-by-design{close_quotes} approach will produce micromirror array surfaces that are limited in flatness only by the surface deposition roughness of the structural material. Ultimately, the combination of advanced process and layout capabilities have permitted the fabrication of highly optimized micromirror arrays for adaptive optics. {copyright} {ital 1999 American Institute of Physics.}
- Research Organization:
- Sandia National Laboratory
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 700891
- Report Number(s):
- CONF-990103--
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 458; ISSN 0094-243X; ISSN APCPCS
- Country of Publication:
- United States
- Language:
- English
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