Thin film adhesion by nanoindentation-induced superlayers. Final report
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN (US)
This work has analyzed the key variables of indentation tip radius, contact radius, delamination radius, residual stress and superlayer/film/interlayer properties on nanoindentation measurements of adhesion. The goal to connect practical works of adhesion for very thin films to true works of adhesion has been achieved. A review of this work titled ''Interfacial toughness measurements of thin metal films,'' which has been submitted to Acta Materialia, is included.
- Research Organization:
- Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN (US)
- Sponsoring Organization:
- Division of Materials Science, Office of Basic Energy Sciences, USDOE Office of Energy Research (ER) (US)
- DOE Contract Number:
- FG02-96ER45574
- OSTI ID:
- 809372
- Report Number(s):
- DOE/ER/45574--1
- Country of Publication:
- United States
- Language:
- English
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