Asymmetric extreme ultraviolet scattering from sputter-deposited multilayers
Journal Article
·
· Physical Review B: Condensed Matter and Materials Physics
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 800324
- Report Number(s):
- LBNL/ALS-29537; TRN: US0202550
- Journal Information:
- Physical Review B: Condensed Matter and Materials Physics, Vol. 59, Issue 20; Other Information: Journal Publication Date: May 1999; PBD: 1 May 1999
- Country of Publication:
- United States
- Language:
- English
Similar Records
Asymmetric extreme ultraviolet scattering from sputter-deposited multilayers
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Nonspecular scattering from extreme ultraviolet multilayer coatings
Journal Article
·
Sat May 01 00:00:00 EDT 1999
· Physical Review, B: Condensed Matter
·
OSTI ID:800324
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Journal Article
·
Fri Jan 01 00:00:00 EST 1999
· Optical Engineering
·
OSTI ID:800324
Nonspecular scattering from extreme ultraviolet multilayer coatings
Journal Article
·
Thu Jun 01 00:00:00 EDT 2000
· Physica B: Condensed Matter (Amsterdam)
·
OSTI ID:800324